Properties of amorphous a-CH (:N) films synthesized by direct ion beam deposition and plasma assisted chemical vapour deposition
Hydrogenated carbon films and hydrogenated films containing nitrogen have been synthsized by direct ion beam deposition (IBD) using cyclohexane and methane as precursors and by plasma-assisted chemical vapour deposition (PACVD) using cyclohexane and acetylene as precursors. The elemental composition has been assessed by gas-chromatography. The films structure has been analyzed by FTIR, Raman, NEXAFS spectroscopy and X-ray reflectivity. The hardness has been determined by nanoindentation and microhardness measurements, and the stress by optical profilometry.
Bibliographic Reference: Paper presented: Conference on Diamond, Diamond like materials, Nitrides and Silicon Carbide, Creta (GR), September 13-18th, 1998
Availability: Available from DG XIII D-2 as Paper EN 41753 ORA
Record Number: 199910206 / Last updated on: 1999-03-12
Original language: en
Available languages: en