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Hydrogenated carbon films and hydrogenated films containing nitrogen have been synthsized by direct ion beam deposition (IBD) using cyclohexane and methane as precursors and by plasma-assisted chemical vapour deposition (PACVD) using cyclohexane and acetylene as precursors. The elemental composition has been assessed by gas-chromatography. The films structure has been analyzed by FTIR, Raman, NEXAFS spectroscopy and X-ray reflectivity. The hardness has been determined by nanoindentation and microhardness measurements, and the stress by optical profilometry.

Additional information

Authors: LENARDI C, JRC, Ispra (IT);BAKER M, JRC, Ispra (IT);GISSLER W, JRC, Ispra (IT);BRIOIS V, LURE, Centre University, Paris (FR);NOBILI L, Politecnico di Milano (IT);PizeRI P, Universite di Milano (IT)
Bibliographic Reference: Paper presented: Conference on Diamond, Diamond like materials, Nitrides and Silicon Carbide, Creta (GR), September 13-18th, 1998
Availability: Available from DG XIII D-2 as Paper EN 41753 ORA
Record Number: 199910206 / Last updated on: 1999-03-12
Original language: en
Available languages: en