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The chemical reactions and physical processes which occur at the surface of hydrocarbon films during deposition from low-temperature hydrcarbon plasmas are reviewed. Special emphasis is placed on the chemical reactions of atomic hydrogen, the interaction of energetic particles with the solid, and the synergistic effects between them. The interaction of energetic particles with the surface of the growing film has been simulated in the binary collision approximation by means of the TRIM.SP computer code. The sputtering and displacement yields were calculated for hydrogen interacting with a carbonaceous surface, such as adsorption, abstraction,addition, and etching, are briefly reviewed and summarized. Furthermore, investigations of synergistic effects using thermal, atomic hydrogen and low-energy hydrogen ion beams are discussed. The film growth of hydrocarbon films from hydrocarbon plasmas was investigated experimentally by real-time, in situ ellipsometry and a variety of ex-situ analyses. The real-time possibilities and the submonlayer sensitivity of ellipsometry allow detailed investigation of the growth process in the plasma environment. The temperature dependence of the growth and the interaction of atomic hydrogen and energetic particles with the film surface were thoroughly investigated. The experimentally observable net deposition rate represents a competition between a temperature-independent deposition process and the temperature-dependent erosion by atomic hydrogen. At very low ion energies the synergistic interaction between atomic hydrogen and the ions leads to 'ion-assisted chemical erosion'. The interaction of ions with the surface generates a modified layer on top of the film surface. This modified later is an intrinsic property of the deposition as will as the erosion process at ion energies above about 30 eV. The deposition results are discussed on the bases of the reviewed microscopic processes and a framework for understanding film growth is prese

Additional information

Authors: JACOB W, Max-Planck-Institut fur Plasmaphysik, Garching bei Munchen (DE)
Bibliographic Reference: Article: Thin Solid Films, 326(1998)1-42
Record Number: 199910607 / Last updated on: 1999-04-01
Original language: en
Available languages: en