ECR Plasmas for thin-film deposition
Microwave plasma sources utilizing additionally electron resonance for more efficient plasma production are becoming more and more interesting for various kinds of surface treatments, such as etching or thin-film deposition. This contribution gives first a brief survey of the pertaining physics of microwave coupling, propagation, and wave damping in a magnetized plasma under ECR conditions. In the second section a few examples of ECR sources are discussed in more detail. This includes the 'Standard ECR Reactor' consisting of a short cylindrical solenoid which produces a divergent magnetic field to provide ECR conditions and to expel ECR plasma as dense ambipolar flow. A second example is an ECR source for industrial film deposition on substrates of large dimensions. A third type of ECR source enable sinside coating of metallic tubes, again of large dimensions.
Bibliographic Reference: Article: Advanced Technologies Based on Wave and Beam Generated Plasmas, (1999), 111-112
Record Number: 199910803 / Last updated on: 1999-06-07
Original language: en
Available languages: en