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Microwave plasma sources utilizing additionally electron resonance for more efficient plasma production are becoming more and more interesting for various kinds of surface treatments, such as etching or thin-film deposition. This contribution gives first a brief survey of the pertaining physics of microwave coupling, propagation, and wave damping in a magnetized plasma under ECR conditions. In the second section a few examples of ECR sources are discussed in more detail. This includes the 'Standard ECR Reactor' consisting of a short cylindrical solenoid which produces a divergent magnetic field to provide ECR conditions and to expel ECR plasma as dense ambipolar flow. A second example is an ECR source for industrial film deposition on substrates of large dimensions. A third type of ECR source enable sinside coating of metallic tubes, again of large dimensions.

Additional information

Authors: WILHELM R, Max-Planck-Institut für Plasmaphysik, Garching (DE)
Bibliographic Reference: Article: Advanced Technologies Based on Wave and Beam Generated Plasmas, (1999), 111-112
Record Number: 199910803 / Last updated on: 1999-06-07
Original language: en
Available languages: en