On the interpretation of microPIXE measurements on a prototype microstructured reference material
In order to determine the beam spot size and the linear or raster scanning properties of ion microbeam systems, a novel reference material has been developed consisting of permalloy strip patterns of different widths on silicon substrate. A prototype chip of this material was investigated with PIXE and RBS. It proved to be extremely useful in the routine to focus the ion microbeam and to determine its spot size. In addition, a detailed investigation of the generated elemental intensity maps and line scan shows the influence of matrix effects on the generation of PIXE signals. Due to the microscopic structure of these samples a geometric dependence of matrix effects in the production of Si X-rays from the substrate material has to be taken into account and even dead-time effects in the counting electronics could be revealed.
Bibliographic Reference: Paper presented: 8th International Conference on Particle-Induced X-ray Emission and its analytical applications, Lund (CH), 14-18 June 1998
Availability: Available from Public Relations and Publications Unit, JRC-Ispra (IT)
Record Number: 199911095 / Last updated on: 1999-08-06
Original language: en
Available languages: en