Mechanical properties, stress evolution and high-temperature thermal stability of nanolayered Mo-Si-N/SiC thin films.
A study of the microstructure, thermal stability, nanoindentation mechanical properties, and residual stress evolution of nanolayered Mo-Si-N/SiC thin films as a function of vacuum annealing time and temperature is reported. Multilayers of Mo-Si-N (MoSi22N25) and SiC were deposited by magnetron sputtering from planar MoSi2 and SiC targets on to single crystal silicon wafers.
Bibliographic Reference: Article: Journal of Vacuum Science & Technology (1999)
Record Number: 199911391 / Last updated on: 1999-09-17
Original language: en
Available languages: en