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Low-pressure plasmas are nowadays widely used for technical applications of plasma-surface interactions, such as plasma etching, material deposition, sputtering etc. For a thorough understanding of individual processes in plasma processing the electron energy distribution function in the bulk plasma is of great importance. The EED determines the rates of all electron induced reactions as ionization, excitation or dissociation of molecules. The ubiquitous assumption of a Maxwellian EED becomes progressively worse for hot and low-density plasmas. Measurements of the EED with probes penetrating the plasma result in deteriorating effects on the plasma and the probe, thus measurements without plasma contact are of great interest. A non-destructive measurement is the detection of radiation emitted by the plasma.

Additional information

Bibliographic Reference: Article: Maximum Entropy and Bayesian Methods, 99-106
Record Number: 199911421 / Last updated on: 1999-10-01
Original language: en
Available languages: en