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Abstract

In order to determine the beam spot size and the linear or raster scanning properties of microprobe analytical systems, a novel reference material has been developed by IRMM, consisting of permalloy (81'7(, Ni, 197e Fe) strip patterns of different widths on a silicon substrate. The general layout of this microstructured reference material with pattern sizes ranging from 2 to 100 pim, fabricated with production schemes of microelectronics circuitry on silicon wafers, is discussed. The large size range of the individual pattern structures makes the material equally applicable to very fine and less focused microbeams. Due to the choice of substrate and pattern materials, these samples exhibit a high elemental contrast suitable for analysis with X-ray and electron detection and with ion scatterina techniques. First chips of this material were investigated with both X-ray tube based as well as synchrotron radiation based X-ray microprobes with capillary optics. Due to the very good definition of the metal lines and their edge profiles (0.5 pim high, shape irregularities and undulations <0. l pim) line scan results of for example XRF can be directly converted to spot size and mici-obeam profile.

Additional information

Authors: WATJEN U, European Commission, Joint Research Centre, Institute for Reference Materials and Measurements (IRMM), Retieseweg, B-2440 Geel, Belgium;BARSONY I, Hungarian Academy of Sciences, Research Institute for Technical Physics and Materials Sciences (MFA) Konkoly-Thege ut 29-33, H-1121 Budapest, Hungary;DUCSO C, Hungarian Academy of Sciences, Research Institute for Technical Physics and Materials Sciences (MFA) Konkoly-Thege ut 29-33, H-1121 Budapest, Hungary
Bibliographic Reference: Article: Mikrochim Acta 132, pp521-525 (2000)
Availability: Mikrochimica Acta
Record Number: 200012013 / Last updated on: 2000-06-05
Category: PUBLICATION
Original language: en
Available languages: en