Energetic and Entropic Contributions to Surface Diffusion and Epitaxial Growth
The study of film morphologies is of great interest to many industrial sectors with several important applications in technical equipment. Factors that influence the epitaxial growth of crystals on films can produce various smooth or rough surfaces depending on the ratio of each component. The morphology of the film surface can be altered during growth through variance in the deposition rate of the crystals onto the surface and changing the temperature of the active substrate. The rate of deposition is the critical factor in determining film roughness. The present study investigates the diffusion of palladium onto clean palladium III plates with a covering of oxygen. These plates are then analyzed with a scanning tunneling microscope in order to investigate the effect coating the film has had on its morphology. Palladium has been found to provide a free-electron surface state resulting in more favourable conditions for deposition and uniform crystal growth. The best film surfaces are produced in an electron free environment with a negative additional energy for more effective diffusion.
Bibliographic Reference: Article: Physical Review Letters, Vol. 84 (2000) No. 8, pp. 1728-1731
Availability: The American Physical Society, Physical Review Letters (Journal)
Record Number: 200012068 / Last updated on: 2000-06-23
Original language: en
Available languages: en