Foundation of a Cesium Plasma by Continuous-Wave Resonance Excitation
The generation of a plasma in cesium vapour via a resonance process is described. The maximum irradiance used was 1.5 W/cm2, which is several orders of magnitude lower than the irradiances conventionally used to form plasmas. Plasa emission consisted of radiative decay from excited states Cs atoms. Optical emission from the plasma was observed from laser powers of 200 ÁW with nonintensified CCD. The ionization efficiency of the plasma was approximately 0.001, with the majority of the atoms in the plasma ionized. The plasma was found to behave linearly with respect to laser power, however nonlinear behaviour was observed as the number density was altered. A collisional mechanism is proposed for the formation of the plasma.
Bibliographic Reference: Article:Applied Spectrometry, further details unavailable
Availability: Applied Spectrometry (Journal)
Record Number: 200012155 / Last updated on: 2000-08-10
Original language: en
Available languages: en