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Abstract

Implantation of heavy ions into light target material (low atomic number) leads to oscillations in partial sputtering yields as a function of the incident fluence as observed by calculations with the Monte Carlo program TRIDYN. These oscillations occur in the energy range of 1 keV- 1MeV. They are also found in the retained amount of implanted species. The oscillations can be explained by the fluence-dependent depth profiles of the implanted species.

Additional information

Authors: ECKSTEIN W, Max-Planc Institut fur Plasmaphysik, Euratom Association, Boltzmannstrausse 2, D-85748 Garching bei Munchen (DE)
Bibliographic Reference: Article: Nuclear Instruments and Methods in Physics Research B 171 (2000) pp. 435-442
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