Oscillations of sputtering yield
Implantation of heavy ions into light target material (low atomic number) leads to oscillations in partial sputtering yields as a function of the incident fluence as observed by calculations with the Monte Carlo program TRIDYN. These oscillations occur in the energy range of 1 keV- 1MeV. They are also found in the retained amount of implanted species. The oscillations can be explained by the fluence-dependent depth profiles of the implanted species.
Bibliographic Reference: Article: Nuclear Instruments and Methods in Physics Research B 171 (2000) pp. 435-442
Record Number: 200013219 / Last updated on: 2001-03-27
Original language: en
Available languages: en