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Abstract

The trend toward large area substrate stressed by the semiconductor and flat Panel display (FPD) industries drives strongly the large area plasma source developments. In this work, a novel inductively coupled plasma source enabling large area plasma production is presented: the magnetic pole enhanced inductively coupled plasma source (MaPE-ICP). The plasma source concept is based on the use of a coil inductor embedded within a high magnetic permeability pole to enhance the magnetic coupling between the coil and the plasma.

A 200 mm MaPE-ICP source has been fully characterized by Langmuir probe, magnetic induction probe and RF electrical parameters measurements. The plasma characteristics are compared to classical JCP sources performances. The plasma uniformity is improved as compared to a spiral coil source, with only a 5.5% variation within the area of the coil radius at 5-mtorr argon pressure. Preliminary plasma uniformity measurements carried out on a 800 by 800 n1m2 show that a non-uniformity of 20% from the average values is achieved over 600 mm with more than 1E[11] ion.cm-3. This demonstrates that the use of a magnetic pole to concentrate the magnetic flux is a key asset for ICP scale up. .

Additional information

Authors: MEZIANI T, EC-JRC, Institute for Health and Consumer Protection, Ispra (IT);ROSSI F, EC-JRC, Institute for Health and Consumer Protection, Ispra (IT);COLPO P, Colpo Consulting, Ispra (IT)
Bibliographic Reference: An article published in: Plasma Sources Science and Technology 10(2001), pp.276-283
Record Number: 200013551 / Last updated on: 2001-07-25
Category: PUBLICATION
Original language: en
Available languages: en
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