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Fully stabilized zirconia (FSZ) samples have been implanted with helium-ions of different energies (200 keV and 1 MeV) and with different doses (1.4E13 to 1.4E16 He{+}/cm{2}). Neutron depth profiling (NDP) for different annealing temperatures and effusion experiments in two different experimental systems with different thermal annealing have been performed on these samples. The samples were analysed by electron microscopy during the various annealing stages. For the low-dose samples, the diffusion of helium is mainly caused by helium interstitial diffusion with an activation energy of 1.6 eV.

Additional information

Authors: DAMEN P M G ET AL, JRC, Institute for Transuranium Elements, Karlsruhe (DE);FROMKNECHT R, Forschungszentrum Kralsruhe, Institut f?r Nukleare Festkfrperphysik, Karlsruhe (DE);VAN VEEN A, Delft university of Technology, Interfaculty Reactor Institute, Delft (NL);LABOHM F, Delft university of Technology, Interfaculty Reactor Institute, Delft (NL)
Bibliographic Reference: An oral report given at: The 7th European Workshop on Modern Developments and Applications in Microbeam Analysis. Held in: Tampere (FI), 6-10 May 2001
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