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The apparently unstoppable advance of miniaturization continues. But soon the limits of optical exposure technology will be reached. Extreme ultraviolet (EUV) radiation with wavelengths of 11 to 14 nanometers is seen as the most promising candidate for a new lithographic technology. The Fraunhofer Institute for Laser Technology ILT in Aachen is one step ahead in the development of EUV radiation sources. Two companies have been set up - to provide light for the semiconductor market of the future.

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Additional information

Authors: MILLER F ET AL (EDITORS), Fraunhofer Gesellschaft, Munich (DE)
Bibliographic Reference: Report: Fraunhofer magazine 2 (2001), pp.59
Availability: Available from Press & Public Relations service Fraunhofer-Gesellschaft Fax: + 49-89-1205713 E-mail:
ISBN: ISSN: 1615-7028
Record Number: 200214215 / Last updated on: 2002-01-08
Original language: en
Available languages: de,en