Current profile tailoring with far off-axis ECH power deposition in the TCV tokamak
Current profile broadening is necessary to create and stabilize vertically highly elongated plasmas with low current (Ip ~ 300 kA) and, therefore, a peaked current profile (q edqe ~ 12). With its 6 independent launchers movable during the discharge (2nd harmonic X-mode, 82.7 GHz, total power 3 MW) the TCV (Tokamak Configuration Variable) is particularly well suited to study the modification of the current profile with ECH (Electron Cyclotron Heating). For a given plasma shape, the internal inductance gives information about the current profile. It appears that far off-axis ECH deposition (Rho ~ 0.7) broadens the current profile while elongating the plasma cross-section and allows the stabilization of highly elongated discharges (Kappa ~ 2.4). The influence of first-path power absorption on the elongation process is also investigated.
Bibliographic Reference: An oral report given at: Jahrestagung in Lausanne Organised by: Swiss Physical Society Held at: Lausanne (CH), 28 February to 1 March 2002
Record Number: 200214453 / Last updated on: 2002-03-08
Original language: en
Available languages: en