Plasma deposition of p-i-n devices using a single PECVD chamber: study of the boron contamination
Bibliographic Reference: A paper published in: 29th EPS Conference on Plasma Physics and Controlled Fusion, Montreux, Switzerland, 17-21 June 2002, EPFL Internal report LRP 728/02, August 2002, pp.75-78.
Availability: Available free of charge from: Ecole polytechnique federale de Lausanne (EPFL), Ecublens, CH-1015 Lausanne Fax +41-21-6934747 Some papers are available in colour on the web at: http://crppwww.epfl.ch/conferences/EPS02/index.html
ISBN: ISSN: 0458-5895
Record Number: 200215278 / Last updated on: 2002-10-15
Original language: en
Available languages: en