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FP5

ECH power deposition at 3rd harmonic in high elongation TCV discharges sustained by 2nd harmonic current profile broadening

Funded under: FP5-EAECTP C

Abstract

This paper summarises the present effort aimed at developing high elongation heated discharges and testing their confinement properties at normalised currents for which the highest ideal MHD limits are predicted. 2nd harmonic (X2) far off-axis ECH/CD is used to stabilise the plasma vertically at high elongation by broadening the current profile in stationary conditions (during the current flat top and over several current diffusion times). Current broadening is maximal for a power deposition in a narrow region (-a/5), for a finite toroidal injection angle and for high plasma density using upper lateral launchers to minimise refraction. In these discharges, which are twice X2 overdense in the centre, 3rd harmonic (X3) is injected from a top launcher to deposit power in the centre and increase the central pressure, simultaneously with far off-axis X2. Using modulated X3, full absorption is measured by the diamagnetic probe. Absorption higher than calculated by thermal ray tracing is occasionally found, indicating absorption on the electron bulk as well as in the suprathermal electron population sometimes with a hollow deposition profile. The high sensitivity of the power coupling to the beam angle stresses the need for developing a mirror feedback scheme to increase the coupling efficiency in transient heating scenarios.

Additional information

Authors: POCHELON A ET AL, Centre de Recherches en Physique des Plasmas, Association EURATOM-Confédération Suisse, Ecole Polytechnique Fédérale de Lausanne (CH);SUSHKOV A, RRC Kurchatov, Moscow (RU)
Bibliographic Reference: A paper presented at: 19th IAEA Fusion Energy Conference. Organised by: International Atomic Energy Agency (IAEA). Held at: Lyon, France, October 14-19 2002.
Availability: Available online at: http://crppwww.epfl.ch/conferences/IAEA02/ Also published in EPFL Internal Report LRP 738/02, available free of charge from: École Polytechnique Fédérale de Lausanne, Ecublens, CH-1015 Lausanne. Fax: +41-21-6934747.
Record Number: 200315843 / Last updated on: 2003-01-31
Category: PUBLICATION
Original language: en
Available languages: en