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The project aimed at optimising sputtering conditions for the reliable GDOES in-depth composition profiling of poorly conductive coatings. Both DC and RF techniques could be employed, although the more classical DC excitation and subsequent analysis quantification based on the Bengston algorithm proved satisfactory in most cases. The project group worked out measuring parameters for the chosen coatings that are suitable for adequate analysing.

Additional information

Authors: APPEL T, ThyssenKrupp, Duisburg (DE);ANGELI J, Voestalpine, Linz (AT);HACKL R: LARNICOL M, Voestalpine, Linz (AT);TUSSET V, Voestalpine, Linz (AT);CARAY J, Voestalpine, Linz (AT);HILDEBRAND L, CRM, Angleur (BE);BJORK T, LSI Univeritat Dortmund, Dortmund (DE);HANSTROM S, LSI Univeritat Dortmund, Dortmund (DE);BENGSTON A, LSI Univerität Dortmund, Dortmund (DE);BJÖRK T, LSI Univerität Dortmund, Dortmund (DE);HANSTRÖM S, LSI Univerität Dortmund, Dortmund (DE)
Bibliographic Reference: EUR 21341 EN (2005), 96 pp. Euro: 15
Availability: EUR-OP reference: KI-NA-21341-EN-S Available from EUR-OP sales agents URL:
ISBN: ISBN: 92-894-9637-1
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