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Abstract

Growth and erosion of amorphous hydrogenated carbon (a-C:H) films from nitrogen-containing gas mixtures was studied in an electron-cyclotron-resonance low-temperature plasma. Deposition and erosion rates were measured as a function of nitrogen admixture and ion energy. At low energy, N(2) addition to methane plasmas causes a reduction of the deposition rates that does not exceed significantly the expected reduction due to dilution. At higher ion energies the deposition rate reduces further and finally switches to net erosion. Erosion of a-C:H films in N(2)/H(2) mixtures is much more efficient than in pure H(2) and N(2). The erosion rate drops with increasing N(2) admixture almost proportional to the total ion flux if the substrate is at floating potential. For higher ion energies the erosion rate dramatically increases and shows a clear maximum at around 25% N(2) flow ratio.

Additional information

Authors: SCHWARZ-SELINGER T, Max-Planck-Institut für Plasmaphysik, IPP-EURATOM Association, Garching (DE);HOPF C, Max-Planck-Institut für Plasmaphysik, IPP-EURATOM Association, Garching (DE);SUN C, Max-Planck-Institut für Plasmaphysik, IPP-EURATOM Association, Garching (DE);JACOB W, Max-Planck-Institut für Plasmaphysik, IPP-EURATOM Association, Garching (DE)
Bibliographic Reference: An article published in: Journal of Nuclear Materials (2007), online edition
Availability: This article can be accessed online by subscribers, and can be ordered online by non-subscribers, at: http://www.sciencedirect.com/science/journal/00223115
Record Number: 200718991 / Last updated on: 2007-03-26
Category: PUBLICATION
Original language: en
Available languages: en
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