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Abstract

Combined magnetron sputtering and ion implantation (CMSII) is a deposition technique involving simultaneous magnetron sputtering and high energy ion bombardment of the coating during its growth. A high voltage pulse discharge (U=40 kV, tau=20 mu s, f=25 Hz) is superposed over the magnetron deposition and in this way, positive ions are accelerated to the components to be coated, bombarding initially the substrate and then the coating itself. In the framework of the ITER-like wall project this method was applied to produce nanostructured W coatings on the carbon fibre composite (CFC) substrate. These coatings have been characterized in terms of adhesion, thickness, structure and resistance to high thermal loads (up to 23.5 MW m{-2}). Based on the results of these tests, which are presented in this paper, CMSII technology was selected for coating about 1100 tiles with a 10 mu m tungsten layer for the JET first wall and divertor.

Additional information

Authors: RUSET C, National Institute for Laser, Plasma and Radiation Physics, EURATOM Association MEdC, Bucharest-Magurele (RO);GRIGORE E, National Institute for Laser, Plasma and Radiation Physics, EURATOM Association MEdC, Bucharest-Magurele (RO);MAIER H, Max-Planck-Institut für Plasmaphysik, IPP-EURATOM Association, Garching (DE);NEU R, Max-Planck-Institut für Plasmaphysik, IPP-EURATOM Association, Garching (DE);LI X, School of Engineering, The University of Birmingham, Birmingham (GB);DONG H, School of Engineering, The University of Birmingham, Birmingham (GB);MITTEAU R, Département de Recherches sur la Fusion Contrôlée, Association Euratom-CEA sur la Fusion, CEA Cadarache, Saint-Paul-lez-Durance (FR);COURTOIS X, Département de Recherches sur la Fusion Contrôlée, Association Euratom-CEA sur la Fusion, CEA Cadarache, Saint-Paul-lez-Durance (FR)
Bibliographic Reference: An article published in: Physica Scripta T128 (2007), pp. 171-174
Availability: This article can be accessed online by subscribers, and can be ordered online by non-subscribers, at: http://dx.doi.org/10.1088/0031-8949/2007/T128/033
Record Number: 200719139 / Last updated on: 2007-04-11
Category: PUBLICATION
Original language: en
Available languages: en