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Abstract

Using a filtered vacuum arc deposition device, stoichiometric aluminum oxide (Al(2)O(3)) films, with thickness ranging from 20 nm to several microns, were produced under various substrate bias voltages and temperatures. Analysis of the resulting alumina crystal structures was performed with transmission electron microscopy, Fourier transform infrared spectroscopy and X-ray diffraction. Depending on the negative substrate bias voltage, the deposition temperature required to form alpha-Al(2)O(3) could be reduced. A crystal phase diagram showing the effect of bias and temperature is presented. Also, preliminary hydrogen permeation measurements of these coatings deposited on thin palladium foil show a good barrier performance as compared with uncoated samples.

Additional information

Authors: BRILL R, Max-Planck-Institut für Plasmaphysik, IPP-EURATOM Association, Garching (DE);KOCH F, Max-Planck-Institut für Plasmaphysik, IPP-EURATOM Association, Garching (DE);MAZURELLE J, Max-Planck-Institut für Plasmaphysik, IPP-EURATOM Association, Garching (DE);LEVCHUK D, Max-Planck-Institut für Plasmaphysik, IPP-EURATOM Association, Garching (DE);BALDEN M, Max-Planck-Institut für Plasmaphysik, IPP-EURATOM Association, Garching (DE);MAIER H, Max-Planck-Institut für Plasmaphysik, IPP-EURATOM Association, Garching (DE);BOLT H, Max-Planck-Institut für Plasmaphysik, IPP-EURATOM Association, Garching (DE);YAMADA-TAKAMURA Y, Institute for Materials Research, Tohoku University, Sendai (JP)
Bibliographic Reference: An article published in: Surface and Coatings Technology, Volumes 174-175, pp. 606-610 (2003)
Availability: This article can be accessed online by subscribers, and can be ordered online by non-subscribers, at: http://dx.doi.org/doi:10.1016/S0257-8972(03)00539-5
Record Number: 200719173 / Last updated on: 2007-05-21
Category: PUBLICATION
Original language: en
Available languages: en