Community Research and Development Information Service - CORDIS

Abstract

Low hydrogen diffusivity and solubility of aluminum oxide make a vapor deposited aluminum oxide (Al(2)O(3)) film an anticipated hydrogen permeation barrier coating. In this paper, amorphous Al(2)O(3) film was deposited using filtered vacuum arc method. As a substrate, vapor deposited amorphous tungsten oxide (WO(3)) film was used in order to characterize hydrogen permeation barrier performance of the Al(2)O(3) film utilizing coloration of WO(3) when it forms H(x)WO(3). The samples were exposed to the flux and angular quantified atomic hydrogen beam, and the degree of coloration was characterized by visible to near infrared range transmission spectroscopy. Using this method, a half-micron thick amorphous Al(2)O(3) film reducing atomic hydrogen reaching the underlying WO(3) film to 3x10{-4} was measured. Furthermore, Al(2)O(3) film as thin as 20 nm showed atomic hydrogen reduction of 4x10{-3}. The results indicate effectiveness of thin vapor deposited Al(2)O(3) film as a permeation barrier against atomic hydrogen.

Additional information

Authors: YAMADA-TAKAMURA Y, Department of Metallurgy and Materials Science, The University of Tokyo, Tokyo (JP);KOCH F, Max-Planck-Institut für Plasmaphysik, IPP-EURATOM Association, Garching (DE);MAIER H, Max-Planck-Institut für Plasmaphysik, IPP-EURATOM Association, Garching (DE);BOLT H, Max-Planck-Institut für Plasmaphysik, IPP-EURATOM Association, Garching (DE)
Bibliographic Reference: An article published in: Surface and Coatings Technology, Volume 153, Issues 2-3, pp. 114-118 (2002)
Availability: This article can be accessed online by subscribers, and can be ordered online by non-subscribers, at: http://dx.doi.org/doi:10.1016/S0257-8972(01)01697-8
Follow us on: RSS Facebook Twitter YouTube Managed by the EU Publications Office Top