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Abstract

Carbon films doped with Ti, V, W, Zr, Cr, and Cu were produced by magnetron sputtering. To predict the film composition, the deposition rates were systematically studied as a function of discharge power and working pressure. The achieved dopant concentrations range from 20 down to 1 at %. The films are laterally homogeneously doped and show columnar growth. The dopant distribution is not thermally stable. After heating at 1100 K, the carbides TiC, VC, WC, ZrC, and Cr(3)C(2) are definitely present and their grain size is on the nanometre scale. Cu segregates out. There are strong indications of the formation of carbides already during deposition.

Additional information

Authors: BALDEN M, Max-Planck-Institut für Plasmaphysik, IPP-EURATOM Association, Garching (DE);CIECIWA B T, Max-Planck-Institut für Plasmaphysik, IPP-EURATOM Association, Garching (DE);QUINTANA I, Max-Planck-Institut für Plasmaphysik, IPP-EURATOM Association, Garching (DE);DE JUAN PARDO E, Max-Planck-Institut für Plasmaphysik, IPP-EURATOM Association, Garching (DE);KOCH F, Max-Planck-Institut für Plasmaphysik, IPP-EURATOM Association, Garching (DE);SIKORA M, AGH University of Science and Technology, Krakow (PL);DUBIEL B, AGH University of Science and Technology, Krakow (PL)
Bibliographic Reference: An article published in: Surface and Coatings Technology, Volume 200, Issues 1-4, pp. 413-417 (2005)
Availability: This article can be accessed online by subscribers, and can be ordered online by non-subscribers, at: http://dx.doi.org/doi:10.1016/j.surfcoat.2005.02.218
Record Number: 200719176 / Last updated on: 2007-05-21
Category: PUBLICATION
Original language: en
Available languages: en
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