Lithographic and photochemical patterning of biomolecules
A novel, biocompatible photoresist and process for the selective biomolecular functionalization of solid support has been developed. This lift-off approach to patterning of biomolecules has the advantage of being independent from the specific biomolecule. The photoresist requires relatively low exposure doses, low baking temperature and is developed in developers that will not affect the biomolecules. It has already been tried for the inner partition of capillaries where the photolithographic requirements are even more demanding, owing to the cylindrical geometry and the results were satisfactory. At planar surfaces performs even better. It can bee used for a wide range of applications requiring patterning of protein or DNA molecules, such as biosensor arrays. Further development work is needed for achieving wider process windows. Additionally, photografting techniques have been tried for the patterning of capillaries using aminogroup carrying photoreagents with encouraging results.
Record Number: 25257 / Last updated on: 2000-09-07
Collaboration sought: Joint venture agreement
Stage of development: Preliminary design, feasibility study