Servicio de Información Comunitario sobre Investigación y Desarrollo - CORDIS

FP5

MINT Informe resumido

Project ID: IST-2001-32152
Financiado con arreglo a: FP5-IST
País: United Kingdom

Electron beam lithography of nanoelectrodes

A spectrum of planar fabrication processes have been developed to enable nanoelectrodes to be made for use in nanotechnology experiments requiring electrical contact to be made. Typical dimensions are electrode width 20nm, tip radius 10nm, and electrode separation of 20nm. The electrodes can be made on a range of substrates using electron beam lithography in a routine manner. Typical materials are Ti:Pd:Au, deposited in that order in a carousel based electron beam evaporator. Ti is used to promote adhesion and Pd acts as a barrier layer between the Ti and the Au. The principal metal is Au, but other materials such as Pt are available.

A process has also been developed for nanofluidics based on e-beam lithography in conjunction with UV3 resist. Tube IDs of 50nm with ODs of 200nm are achievable. Interconnect and branching technologies on planar substrates have been demonstrated.

Contacto

David CUMMING, (Professor of Microsystem Technology)
Tel.: +44-1413-305233
Fax: +44-1413-304907
Correo electrónico
Síganos en: RSS Facebook Twitter YouTube Gestionado por la Oficina de Publicaciones de la UE Arriba