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FP5

NANOMASS II Résumé de rapport

Project ID: IST-2001-33068
Financé au titre de: FP5-IST
Pays: Spain

Fabrication of nanomechanical structures on CMOS substrates by AFM

An Atomic Force Microscope (AFM) is used for defining nanometer scale structures integrated in CMOS circuits. The CMOS circuits are fabricated using SOI wafers as starting material. The CMOS circuit is fabricated in the silicon bottom layer and the mechanical structure is fabricated in the top SOI layer. The nanomechanical structure fabrication process starts after completing the CMOS circuit fabrication.

A specific cleaning process of the area where the nanomehcanicl structure will be defined has been developed to ensure a low surface roughness and lack of contaminant particles. After the cleaning process, the surface is covered with a thin layer of aluminium, which is locally oxidized by the tip of the AFM using AFM local oxidation nanolithography. The non-oxidized aluminium is removed, and the reaming aluminium oxide is used as an etching mask for reactive ion etching of the silicon.

Finally, the moveable part of the mechanical structure is released by un under-etching of the silicon oxide. The methods can be applied in general for defining nanostructures on pre-processed CMOS substrates.

Informations connexes

Contact

Francesc PEREZ-MURANO, (Senior Researcher)
Tél.: +34-935947700
Fax: +34-935801496
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