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FP5

ASSYST Résumé de rapport

Project ID: G1RD-CT-2002-00701
Financé au titre de: FP5-GROWTH
Pays: Germany

Semiconductor fabrication:High specification, high volume, batch manufacturing process ultra pure gas monitoring and control capability

Design and construction of a laboratory demonstration spectrometer based on free space optical design with the goal to achieve a significant performance enhancement in a multi-component, modular configuration has been successfully made. The spectrometer, even though designed for measurement of traces of contaminating gases in the ultra pure gas feed lines to semiconductor fabrication, will have a number of additional applications in production processes where measurements and subsequent control of very low concentrations of specific gases will improve production yield and reduce contamination. Typical gases are O2, H2O and H2S.

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Contact

Volkmar HOPFE, (Head of Department Thin Film CVD Technology)
Tél.: +49-035-12583402
Fax: +49-035-12583300
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