Start date: 2009-01-01, End date: 2011-12-01
Water immersion lithography has been widely accepted as patterning technology for the 45nm technology node, but solutions for the patterning of 32nm and 22nm technology nodes are not clear yet. EUV lithography is not yet available for industrial use, in spite of the impressiv...
Record Number: 201990
Last updated on: 2016-06-14