Trio-optimally integrated vacuum/abatement/monitoring equipment for demanding semiconductor manufacturing processes

Informazioni relative al progetto

TRIO-VAMP

ID dell’accordo di sovvenzione: FP4_24032

Progetto chiuso

Data di avvio 1 Dicembre 1996

Data di completamento 30 Novembre 1997

Finanziato da

• Specific research and technological development programme in the field of information technologies, 1994-1998

Costo totale € 360 000,00

Contributo UE € 180 000,00

Coordinato da

Texas Instruments Deutschland Gmbh
Germany

Campo scientifico

• engineering and technology › mechanical engineering › manufacturing engineering
• natural sciences › physical sciences › electromagnetism and electronics › semiconductivity

Programma(i)

• FP4-ESPRIT 4 - Specific research and technological development programme in the field of information technologies, 1994-1998

Argomento(i)

• 2.9 - Building blocks, methods & tools for semiconductor app&techs

Invito a presentare proposte

Data not available

Meccanismo di finanziamento

EIF - Marie Curie actions-Intra-European Fellowships

Coordinatore

Texas Instruments Deutschland Gmbh

• Contributo UE: Nessun dato
• Indirizzo: Haggertystrasse 1 ; 85356 Freising ; Germania
• Costo totale: Nessun dato