Objective
The expertise on spectroscopy of adsorption and chemical composition in the two Ukranian groups will be combined with the unique possibilities of vacuum-ultraviolet and soft x-ray photochemistry available to the two groups at the synchrotron radiation facilities at BESSY and SUPERACO. This will enable participants to study basic as well as applied aspects of photochemical etching of metal and semiconductor surfaces.
The central aim is an optimization of microstructuring due to photochemical etching by a search for high-efficiency and good structural resolution in the short wavelength range as well as by an investigation of the involved microprocesses and a subsequent predictive modelling.
Very stimulating is the high quantum efficiency far above unity for the etching of GaAs with C12 and Si with XeF2 around 120 nm with excellent spatial resolution. The preliminary studies of the intermediate and final reaction products indicate several coupled reaction and desorption processes promising a wealth of interesting surface physics and chemistry.
In this joint research project the microstructuring and etching will be performed at BESSY in Berlin with the assistance of collaborators from Ukraine. Reactions products on the etched samples will be analysed in Kharkov. Parallel studies on surface composition and the basic processes involved in the etching process will be carried out in Kiev and Orsay. The exchange of collaborators between the different laboratories is necessary to transfer the special expertise and to specify the etching condition for samples which will be analysed in the other laboratories.
Topic(s)
Call for proposal
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14195 Berlin
Germany