Ziel
The development and manufacture of an electron beam testing system for the testing and evaluation of advanced VLSI.
The system to based on the voltage contrast development work carried out at Siemens and the scanning electron microscope (SEM) system developed by Cambridge Instruments. The equipment will be commercially realized by Cambridge Instruments. The development and manufacturing work will be carried out in 3 overlapping phases:
Phase I -Development of basic equipment and extension techniques;
Phase II - Enhancements and transfer to the new instrumentation;
Phase III - Upgrading of instrumentation to provide an automated system utilising the results of the earlier phases.
Users will participate between Phases I, II and III.
The manufacturer will deliver to the users a first equipment prototype (EB1).The equipment will be tried and tested by the users and the manufacturer based on the outcome of the trials will deliver an upgraded version (EB2).Reports on the system performance will be produced by the users.
Programm/Programme
Thema/Themen
Data not availableAufforderung zur Vorschlagseinreichung
Data not availableFinanzierungsplan
Data not availableKoordinator
CB1 3QH CAMBRIDGE
Vereinigtes Königreich