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Single Nanometer Manufacturing for beyond CMOS devices

Project description


Very advanced nanoelectronic components: design, engineering, technology and manufacturability
The aim of the project is to investigate and develop novel Technologies for Single Nanometer Manufacturing (SNM), reaching the theoretical limit of future nanoelectronic and nanomechnanical systems.

High performance Single Nanometer Manufacturing is an enabling technology for nanoelectronics, capable to open new horizons in the emerging world of nanotechnology.  Sustainable competence and excellence in the project should secure a new path for manufacturing ultimate electronic, optical and mechanical devices never done before.  A 15 member strong team led by Prof. Ivo W. Rangelow, Head of Department of Micro- and Nanoelectronic Systems at the Ilmenau University of Technology is working together to achieve ambitious goals:

  • Pushing the limits of the nano-manufacturing down the single nanometer digit
  • Development of nano-lithographic methods for nanometer-size features, overlay placement, inspection and integration in novel nanoelectronic devices
  • Enabling of novel ultra-low power electronics, quantum devices and manipulation of individual electrons
  • Open new horizons for beyond CMOS technology by novel cost-effective, global,  nano-lithographic technologies.

The Moore’s Law has been the basis in long-term planning in the technological developments, resulting in an exponential increase in the number of transistors Si-MOSFET per chip. European Project “SNM” will contribute to next generation nano-manufacturing technologies, for building future quantum electronics and pushing this nanotechnology into many new areas. It is expected that the MOSFET can remain viable down to the 10nm scale. However, below this, difficulty in controlling the device current, and the strong influence of quantum mechanical effects such as electron tunneling, may require new devices. Furthermore, increasing difficulty in fabricating large numbers of highly nano-scale devices using conventional optical lithographic techniques greatly compounds the problem. This indicates that a different approach may be essential to create a ‘beyond‐CMOS’ generation of electronic devices. Manufacturing next generation devices in nanoelectronics, nanophotonics, and nanoelectro-mechanical systems (NEMS) requires lithography at the single‐nanometer level with high alignment accuracy between patterns, acceptable throughput, cost, and high reliability. To address this, SNM-team is working on technology using a combination of high‐resolution scanning probe lithography (SPL) and nanoimprint lithography (NIL). SNM suppose that this arrangement is a promising candidate for high‐throughput device fabrication even at the sub‐5nm scale. Scanning probes are capable of confined nanoscale interactions for imaging, probing of material properties, and lithography at the single‐nanometer scale or even smaller. SNM-team is investigating novel single‐nanometer manufacturing technologies using advanced scanning probes to pattern molecular‐glass‐based resist materials (see Figure 1). Due to the small particle size (<1nm) and truly monodisperse nature (i.e. the particles are all of similar size) of molecular resists, a more uniform and smaller lithographic pixel size can be defined in comparison with conventional resists. Our lithographic process uses the same nanoprobe for atomic force microscope (AFM) imaging to allow pattern overlay alignment, direct writing of features into molecular resists using a highly confined, development‐less resist removal process via emission of low‐energy electrons, and AFM post‐imaging for final in situ inspection.

SNM-technology offers an encouraging direction toward single‐nanometer lithography and can improve throughput significantly by employing parallel, self‐actuated, and self‐sensing probe systems. Probe‐based closed‐loop lithography can be used for sub‐5nm fabrication of nanoimprint templates, as well as reproducible nano-scale prototyping of ‘beyond CMOS’ nano-electronic devices like quantum‐dot and single electron devices.

Call for proposal

FP7-ICT-2011-8
See other projects for this call

Funding Scheme

CP - Collaborative project (generic)

Coordinator

TECHNISCHE UNIVERSITAET ILMENAU
Address
Ehrenbergstrasse 29
98693 Ilmenau
Germany
Activity type
Higher or Secondary Education Establishments
EU contribution
€ 2 115 302
Administrative Contact
Thomas MIROW (Mr.)

Participants (15)

EV GROUP E. THALLNER GMBH
Austria
EU contribution
€ 517 125
Address
Di Erich Thallner Strasse 1
4782 St Florian Am Inn
Activity type
Private for-profit entities (excluding Higher or Secondary Education Establishments)
Administrative Contact
Jakob Harming (Mr.)
INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM
Belgium
EU contribution
€ 1 419 313
Address
Kapeldreef 75
3001 Leuven
Activity type
Research Organisations
Administrative Contact
Christine Van Houtven (Mrs.)
MICROSYSTEMS LTD
Bulgaria
EU contribution
€ 403 240
Address
Chaika 15 D 21
9010 Varna
Activity type
Private for-profit entities (excluding Higher or Secondary Education Establishments)
Administrative Contact
Nikolay Nikolov (Mr.)
IBM RESEARCH GMBH
Switzerland
EU contribution
€ 1 308 930
Address
Saeumerstrasse 4
8803 Rueschlikon
Activity type
Private for-profit entities (excluding Higher or Secondary Education Establishments)
Administrative Contact
Catherine Trachsel (Ms.)
ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE
Switzerland
EU contribution
€ 694 800
Address
Batiment Ce 3316 Station 1
1015 Lausanne
Activity type
Higher or Secondary Education Establishments
Administrative Contact
Kis Andras (Prof.)
SWISSLITHO AG
Switzerland
EU contribution
€ 853 402
Address
Technoparkstrasse 1
8005 Zurich
Activity type
Private for-profit entities (excluding Higher or Secondary Education Establishments)
Administrative Contact
Felix Holzner (Mr.)
UNIVERSITAT BAYREUTH
Germany
EU contribution
€ 610 560
Address
Universitatsstrasse 30
95447 Bayreuth
Activity type
Higher or Secondary Education Establishments
Administrative Contact
Marcus Urban (Mr.)
AGENCIA ESTATAL CONSEJO SUPERIOR DE INVESTIGACIONES CIENTIFICAS
Spain
EU contribution
€ 1 033 797
Address
Calle Serrano 117
28006 Madrid
Activity type
Research Organisations
Administrative Contact
Alberto Sereno Alvarez (Mr.)
VSL B.V.
Netherlands
EU contribution
€ 345 856
Address
Thijsseweg 11
2629 JA Delft
Activity type
Private for-profit entities (excluding Higher or Secondary Education Establishments)
Administrative Contact
Marijn van Veghel (Dr.)
TECHNISCHE UNIVERSITEIT DELFT
Netherlands
EU contribution
€ 905 525
Address
Stevinweg 1
2628 CN Delft
Activity type
Higher or Secondary Education Establishments
Administrative Contact
Kees Hagen (Dr.)
THE OPEN UNIVERSITY
United Kingdom
EU contribution
€ 461 040
Address
Walton Hall
MK7 6AA Milton Keynes
Activity type
Higher or Secondary Education Establishments
Administrative Contact
David Barfield (Mr.)
OXFORD SCIENTIFIC CONSULTANTS LTD
United Kingdom
EU contribution
€ 298 800
Address
St Peters Road 8A
OX14 3SJ Abingdon
Activity type
Private for-profit entities (excluding Higher or Secondary Education Establishments)
Administrative Contact
Philip Prewett (Prof.)
IMPERIAL COLLEGE OF SCIENCE TECHNOLOGY AND MEDICINE
United Kingdom
EU contribution
€ 569 110
Address
South Kensington Campus Exhibition Road
SW7 2AZ London
Activity type
Higher or Secondary Education Establishments
Administrative Contact
Shaun Power (Mr.)
THE UNIVERSITY OF LIVERPOOL
United Kingdom
EU contribution
€ 57 240
Address
Brownlow Hill 765 Foundation Building
L69 7ZX Liverpool
Activity type
Higher or Secondary Education Establishments
Administrative Contact
Cherie Judge (Ms.)
OXFORD INSTRUMENTS NANOTECHNOLOGY TOOLS LIMITED
United Kingdom
EU contribution
€ 417 960
Address
Tubney Woods
OX13 5QX Abingdon
Activity type
Private for-profit entities (excluding Higher or Secondary Education Establishments)
Administrative Contact
Andy Roylance (Mr.)