Computer modelling and experimental validation of plasmas and plasma- surface interactions, for a deep insight in cryogenic etching

Project Information

Cryoetch

Grant agreement ID: 702604

DOI 10.3030/702604

Project closed

EC signature date 14 March 2016

Start date 8 June 2016

End date 7 June 2018

Funded under

• EXCELLENT SCIENCE - Marie Skłodowska-Curie Actions

Total cost € 160 800,00

EU contribution € 160 800,00

Coordinated by

UNIVERSITEIT ANTWERPEN
Belgium

Publications

Peer reviewed articles (3)

Propagation of a plasma streamer in catalyst pores

Author(s): Quan-Zhi Zhang, Annemie Bogaerts
Published in: Plasma Sources Science and Technology, Issue 27/3, 2018, Page(s) 035009, ISSN 1361-6595
Publisher: IOP Publishing Ltd
DOI: 10.1088/1361-6595/aab47a

Mechanisms for plasma cryogenic etching of porous materials

Author(s): Quan-Zhi Zhang, Stefan Tinck, Jean-François de Marneffe, Liping Zhang, Annemie Bogaerts
Published in: Applied Physics Letters, Issue 111/17, 2017, Page(s) 173104, ISSN 0003-6951
Publisher: American Institute of Physics
DOI: 10.1063/1.4999439

Importance of surface charging during plasma streamer propagation in catalyst pores

Author(s): Quan-Zhi Zhang, Wei-Zong Wang, Annemie Bogaerts
Published in: Plasma Sources Science and Technology, Issue 27/6, 2018, Page(s) 065009, ISSN 1361-6595
Publisher: IOP Publishing Ltd
DOI: 10.1088/1361-6595/aaca6d