Objective
IMPROVE aims to improve European Semiconductor fabs efficiency by providing methods and tools to better control the process variability, reduce the cycle time and enhance the effectiveness of the production equipment. This will be achieved thanks to 3 major developments.
The development of Virtual Metrology technics allowing to control the process at wafer level whilst suppressing standard metrology steps.
The development of Predictive Equipment Behaviour technics to improve the process tools reliability whilst optimizing the maintenance frequency and increasing the equipment uptime.
The development of Dynamic Risk Assessment and Dynamic Control Plan concepts, suppressing unnecessary measurements steps whilst dynamiccaly improving the control plan efficiency .
The impact of the integration of these technics in the line decision systems will also be evaluated and assessed.
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Call for proposal
JU-ENIAC-2008-1
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Coordinator
38920 Crolles
France
Participants (35)
13790 Rousset
20864 Agrate Brianza
20864 Agrate Brianza
85579 Neubiberg
9500 Villach
. Leixlip Kildare
13790 Rousset
8141 Unterpremstatten
34098 Montpellier
85238 Petershausen
75002 Paris
5 Dublin
38330 Montbonnot Saint-martin
00156 Rome
80686 Munchen
75015 Paris 15
80539 Muenchen
D9 Dublin
27100 Pavia
20122 Milano
35122 Padova
42023 Saint Etienne Cedex
38000 Grenoble
20041 Agrate Brianza
3045 504 Coimbra
10129 Torino
75794 Paris
2700 Wiener Neustadt
90411 Nürnberg
93161 Sinzing
80131 Napoli
48155 Munster
9 Dublin
01099 Dresden
91054 Erlangen