Objective
IMPROVE aims to improve European Semiconductor fabs efficiency by providing methods and tools to better control the process variability, reduce the cycle time and enhance the effectiveness of the production equipment. This will be achieved thanks to 3 major developments.
The development of Virtual Metrology technics allowing to control the process at wafer level whilst suppressing standard metrology steps.
The development of Predictive Equipment Behaviour technics to improve the process tools reliability whilst optimizing the maintenance frequency and increasing the equipment uptime.
The development of Dynamic Risk Assessment and Dynamic Control Plan concepts, suppressing unnecessary measurements steps whilst dynamiccaly improving the control plan efficiency .
The impact of the integration of these technics in the line decision systems will also be evaluated and assessed.
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Fields of science
Call for proposal
JU-ENIAC-2008-1
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Coordinator
38920 Crolles
France
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Participants (35)
13790 Rousset
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20864 Agrate Brianza
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20864 Agrate Brianza
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85579 Neubiberg
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9500 Villach
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. Leixlip Kildare
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13790 Rousset
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8141 Unterpremstatten
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34098 Montpellier
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85238 Petershausen
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75002 Paris
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5 Dublin
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38330 Montbonnot Saint-martin
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00156 Rome
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80686 Munchen
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75015 Paris 15
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80539 Muenchen
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D9 Dublin
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27100 Pavia
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20122 Milano
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35122 Padova
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42023 Saint Etienne Cedex
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38000 Grenoble
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20041 Agrate Brianza
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3045 504 Coimbra
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10129 Torino
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75794 Paris
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2700 Wiener Neustadt
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90411 Nürnberg
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93161 Sinzing
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80131 Napoli
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48155 Munster
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9 Dublin
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01099 Dresden
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91054 Erlangen
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