Implementing Manufacturing science solutions to increase equipment PrOductiVity and fab pErformance

Objective

IMPROVE aims to improve European Semiconductor fabs efficiency by providing methods and tools to better control the process variability, reduce the cycle time and enhance the effectiveness of the production equipment. This will be achieved thanks to 3 major developments.
The development of Virtual Metrology technics allowing to control the process at wafer level whilst suppressing standard metrology steps.
The development of Predictive Equipment Behaviour technics to improve the process tools reliability whilst optimizing the maintenance frequency and increasing the equipment uptime.
The development of Dynamic Risk Assessment and Dynamic Control Plan concepts, suppressing unnecessary measurements steps whilst dynamiccaly improving the control plan efficiency .
The impact of the integration of these technics in the line decision systems will also be evaluated and assessed.
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Field of science

• /natural sciences/physical sciences/electromagnetism and electronics/electrical conductivity/semiconductor

Programme(s)

• FP7-JTI - Specific Programme "Cooperation": Joint Technology Initiatives

Topic(s)

• SP1-JTI-ENIAC - JTI-ENIAC (Nanoelectronics Technologies 2020)

Call for proposal

JU-ENIAC-2008-1
See other projects for this call

Funding Scheme

Coordinator

Participants (35)