IMPROVE aims to improve European Semiconductor fabs efficiency by providing methods and tools to better control the process variability, reduce the cycle time and enhance the effectiveness of the production equipment. This will be achieved thanks to 3 major developments.
The development of Virtual Metrology technics allowing to control the process at wafer level whilst suppressing standard metrology steps.
The development of Predictive Equipment Behaviour technics to improve the process tools reliability whilst optimizing the maintenance frequency and increasing the equipment uptime.
The development of Dynamic Risk Assessment and Dynamic Control Plan concepts, suppressing unnecessary measurements steps whilst dynamiccaly improving the control plan efficiency .
The impact of the integration of these technics in the line decision systems will also be evaluated and assessed.
Call for proposal
See other projects for this call
Funding SchemeJTI-CP-ENIAC - Joint Technology Initiatives - Collaborative Project (ENIAC)
20864 Agrate Brianza
42023 Saint Etienne Cedex
20041 Agrate Brianza