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Technology Advances for Pilotline of Enhanced Semiconductors for 3nm

Objective

"In line with industry needs, Moore’s law, scaling in ITRS 2013, and ECSEL JU MASP 2017, the main objective of the
TAPES3 project is to discover, develop and demonstrate lithographic, metrology, EUV mask technology, devices and process modules enabling 3nm node technology. This is planned with available EUV/NA 0.33 scanners, and with system design and integration of a new hyper NA EUV lithography tool to enable more single exposure patterning at 3nm to create complex integrated circuits. Process steps for 3D devices as alternative to the conventional FINFet will be explored for application in the 3nm node. The impact of the application of these so called 3D devices on circuit topology and logic design will be explored. During the development, specific challenges in metrology for the characterization of 3D devices will be assessed and metrology tools will be newly developed. The result will be demonstrated in the imec pilot line.
The TAPES3 project relates to the ECSEL work program topic Equipment, Material and Manufacturing. It addresses and targets, as set out in MASP, the grand Challange of ""More Moore Equipment and Materials for sub 10nm technologies"" by exploring the requirements and solutions for the 3nm node. The project touches the core of the continuation of Moore’s law. Moreover, the cost aware development process will support the involved companies, and will place them in a preferred position over their worldwide competition. Through their worldwide affiliations, the impact of the TAPES3 project will be felt outside Europe in America and Asia Pacific semiconductor centers and is expected to benefit the European economy a lot by supporting its semiconductor equipment and metrology sectors with innovations, exports and employment."

Coordinator

ASML NETHERLANDS B.V.

Address

De Run 6501
5504dr Veldhoven

Netherlands

Activity type

Private for-profit entities (excluding Higher or Secondary Education Establishments)

EU Contribution

€ 7 501 242,45

Participants (27)

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APPLIED MATERIALS BELGIUM

Belgium

EU Contribution

€ 190 167,78

APPLIED MATERIALS ISRAEL LTD

Israel

EU Contribution

€ 1 462 650

ADVANCED MASK TECHNOLOGY CENTER GMBH & CO KG

Germany

EU Contribution

€ 80 487,75

COVENTOR SARL

France

EU Contribution

€ 358 802,50

DEMCON ADVANCED MECHATRONICS ENSCHEDE B.V.

Netherlands

EU Contribution

€ 344 999,98

FEI ELECTRON OPTICS BV

Netherlands

EU Contribution

€ 820 654

FRAUNHOFER GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

Germany

EU Contribution

€ 387 050,13

ION BEAM SERVICES

France

EU Contribution

€ 274 096,20

INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM

Belgium

EU Contribution

€ 6 175 448,74

INSTITUT FUER MIKROELEKTRONIK STUTTGART

Germany

EU Contribution

€ 867 464,15

JSR MICRO NV

Belgium

EU Contribution

€ 92 061

KLA-TENCOR CORPORATION (ISRAEL)

Israel

EU Contribution

€ 346 185

LAM RESEARCH AG

Austria

EU Contribution

€ 1 079 510

SIEMENS INDUSTRY SOFTWARE NV

Belgium

EU Contribution

€ 183 675

MENTOR GRAPHICS BELGIUM

Belgium

NOVA MEASURING INSTRUMENTS LTD

Israel

EU Contribution

€ 943 250

OXFORD INSTRUMENTS NANOTECHNOLOGY TOOLS LIMITED

United Kingdom

EU Contribution

€ 29 735,50

OPTIX FAB GMBH

Germany

EU Contribution

€ 168 437,50

PAUL SCHERRER INSTITUT

Switzerland

EU Contribution

€ 134 952,07

PHYSIKALISCH-TECHNISCHE BUNDESANSTALT

Germany

EU Contribution

€ 187 395,90

RECIF TECHNOLOGIES

France

EU Contribution

€ 92 602,19

RHEINISCH-WESTFAELISCHE TECHNISCHE HOCHSCHULE AACHEN

Germany

EU Contribution

€ 169 905,91

SILTRONIC AG

Germany

EU Contribution

€ 515 888,17

SUSS MicroTec Photomask Equipment GmbH & Co. KG

Germany

EU Contribution

€ 135 867,75

NEDERLANDSE ORGANISATIE VOOR TOEGEPAST NATUURWETENSCHAPPELIJK ONDERZOEK TNO

Netherlands

EU Contribution

€ 761 974

VDL ETG TECHNOLOGY & DEVELOPMENT BV

Netherlands

EU Contribution

€ 891 603

CARL ZEISS SMT GMBH

Germany

EU Contribution

€ 4 000 000

Project information

Grant agreement ID: 783247

Status

Ongoing project

  • Start date

    1 October 2018

  • End date

    30 September 2021

Funded under:

H2020-EU.2.1.1.7.

  • Overall budget:

    € 123 445 912,22

  • EU contribution

    € 28 196 106,67

Coordinated by:

ASML NETHERLANDS B.V.

Netherlands