Skip to main content
European Commission logo print header

Development of SiO2 on Si reference materials

Objective



The objectives of the project are the development, manufacture, full characterization and testing of SiO2 on Si specimens with three layer thicknesses with nominal values of 10, 50 and 120 nm, respectively. This should then, if successful, lead to the delivery of SiO2 for the calibration of spectroscopic ellipsometers for the measurement of the thickness of thin films.

STATUS

In progress. The samples have been produced, characterized and analyzed for stability by IMEC. The measurements of their thickness by means of three distinct techniques, namely:

a) Singe Wavelength Ellipsometry (SWE);
b) Spectroscopic Ellipsometry (SE);
c) Transmission Electron Microscopy (TEM);

was then intercompared at different European laboratories.
The SE measurements have shown to be the most more accurate and repeatable. The measured samples have been found to be certifiable for the calibration of ellipsometers: IMEC and RSRE will be in charge of the certification phase.

Topic(s)

Data not available

Call for proposal

Data not available

Coordinator

DBP
EU contribution
No data
Address


Germany

See on map

Total cost
No data

Participants (10)