Objective The aim of the work is to deal with the main difficulties involved in the Plasma Assisted Chemical Vapour Deposition (PA-CVD) of amorphous hydro-generated silicon (a-Si:H) Research has been carried out in order to deal with the main difficulties involved in the plasma assisted chemical vapour deposition (PA-CVD) of amorphous hydrogenerated silicon. The study involves correlating the amorphous film quality with microscopic rather than macroscopic plasma parameters while continuously developing the deposition process. Results so far have shown that poor photon absorption in very thin amorphous silicon enhances photostability but decreases conversation efficiency. This problem was solved by using multijunction cells to absorb a larger spectrum.The idea that stands behind our approach is to correlate the amorphous film quality with microscopic, rather than macroscopic, plasma parameters while continuously developing the deposition process. Our approach is outlined in the following table: 1) Improvement required: 1.1 Enhancement of the deposition rate 1.2 Enhancement of film characteristics - Film uniformity - Film quality 2) Use of extensive diagnostics for the: 2.1 Elucidation of mechanism 2.2 Modelling 2.3 Effective process control 3) Modification of the process 3.1 Modification of plasma characteristics - Geometrical effects - Frequency effects 3.2 Modification of the feed gas - Dilution effects - Use of Disilane 3.3 Alternative and similar materials - Application to a-Si:Ge - Application to a-Si:C - Application to a-Si:F:H Fields of science natural sciencesphysical sciencesplasma physicsnatural scienceschemical sciencesinorganic chemistrymetalloidsnatural sciencesphysical sciencestheoretical physicsparticle physicsphotons Programme(s) FP2-JOULE 1 - Specific research and technological development programme (EEC) in the field of energy - non-nuclear energies and rational use of energy - (JOULE), 1989-1992 Topic(s) Data not available Call for proposal Data not available Funding Scheme CSC - Cost-sharing contracts Coordinator University of Patras EU contribution No data Address Panepistimioupolis Rion 26500 PATRAS Greece See on map Total cost No data Participants (3) Sort alphabetically Sort by EU Contribution Expand all Collapse all Eniricerche SpA Italy EU contribution No data Address Via Ramasini 32 00015 Monterotondo Roma See on map Total cost No data PHILIPPS UNIVERSITAET MARBURG Germany EU contribution No data Address Biegenstrasse 10 MARBURG See on map Links Website Opens in new window Total cost No data UNIVERSITA DEGLI STUDI DI BARI Italy EU contribution No data Address Via G. Orabona 4 Campus Universitario 70125 BARI See on map Total cost No data