Objectif The aim of the work is to deal with the main difficulties involved in the Plasma Assisted Chemical Vapour Deposition (PA-CVD) of amorphous hydro-generated silicon (a-Si:H) Research has been carried out in order to deal with the main difficulties involved in the plasma assisted chemical vapour deposition (PA-CVD) of amorphous hydrogenerated silicon. The study involves correlating the amorphous film quality with microscopic rather than macroscopic plasma parameters while continuously developing the deposition process. Results so far have shown that poor photon absorption in very thin amorphous silicon enhances photostability but decreases conversation efficiency. This problem was solved by using multijunction cells to absorb a larger spectrum.The idea that stands behind our approach is to correlate the amorphous film quality with microscopic, rather than macroscopic, plasma parameters while continuously developing the deposition process. Our approach is outlined in the following table: 1) Improvement required: 1.1 Enhancement of the deposition rate 1.2 Enhancement of film characteristics - Film uniformity - Film quality 2) Use of extensive diagnostics for the: 2.1 Elucidation of mechanism 2.2 Modelling 2.3 Effective process control 3) Modification of the process 3.1 Modification of plasma characteristics - Geometrical effects - Frequency effects 3.2 Modification of the feed gas - Dilution effects - Use of Disilane 3.3 Alternative and similar materials - Application to a-Si:Ge - Application to a-Si:C - Application to a-Si:F:H Champ scientifique natural sciencesphysical sciencesplasma physicsnatural scienceschemical sciencesinorganic chemistrymetalloidsnatural sciencesphysical sciencestheoretical physicsparticle physicsphotons Programme(s) FP2-JOULE 1 - Specific research and technological development programme (EEC) in the field of energy - non-nuclear energies and rational use of energy - (JOULE), 1989-1992 Thème(s) Data not available Appel à propositions Data not available Régime de financement CSC - Cost-sharing contracts Coordinateur University of Patras Contribution de l’UE Aucune donnée Adresse Panepistimioupolis Rion 26500 PATRAS Grèce Voir sur la carte Coût total Aucune donnée Participants (3) Trier par ordre alphabétique Trier par contribution de l’UE Tout développer Tout réduire Eniricerche SpA Italie Contribution de l’UE Aucune donnée Adresse Via Ramasini 32 00015 Monterotondo Roma Voir sur la carte Coût total Aucune donnée PHILIPPS UNIVERSITAET MARBURG Allemagne Contribution de l’UE Aucune donnée Adresse Biegenstrasse 10 MARBURG Voir sur la carte Liens Site web Opens in new window Coût total Aucune donnée UNIVERSITA DEGLI STUDI DI BARI Italie Contribution de l’UE Aucune donnée Adresse Via G. Orabona 4 Campus Universitario 70125 BARI Voir sur la carte Coût total Aucune donnée
