Cel The objective of the project is to develop an advanced CAD tool for the correction of resist heating effects in electron beam lithography (EBL). This will allow designers to simulate and compensate for distortions due to the resist heating effects and thus enable the fabrication of microelectronics structures without distortions. The software tool will be designed for industrial application in the most advanced process of sub-micron microelectronics technology - variable shaped EBL. The heating effect correction program will be integrated into the commercially available post-processor SiCat and the proximity correction tool PROXECCO enabling correction of both proximity and heating effects. A physical model of the resist heating effect will be built for this purpose. The correctness of model and software will be proven by experimental verification. Program(-y) IC-PECO/COPERNICUS - Scientific and technological cooperation between the European Community and European non-member countries, 1992- Temat(-y) Data not available Zaproszenie do składania wniosków Data not available System finansowania CSC - Cost-sharing contracts Koordynator AISS GmbH Wkład UE Brak danych Adres Gotzinger Straße 46 81371 München Niemcy Zobacz na mapie Koszt całkowity Brak danych Uczestnicy (2) Sortuj alfabetycznie Sortuj według wkładu UE Rozwiń wszystko Zwiń wszystko Institute of Computer Systems Słowacja Wkład UE Brak danych Adres Bratislava Zobacz na mapie Koszt całkowity Brak danych SET-SERVIS Rosja Wkład UE Brak danych Adres Moscow Zobacz na mapie Koszt całkowity Brak danych