Obiettivo - To evaluate the emission of waste-gas of Al, TiN/Al, and SiO dry etching processes using CF4, CHF3, C2F6, BCl3, Cl2, SiCl4.- To evaluate waste-gas emission of SiO, PSG and SiN CVD using SiH, PH3 ,TEOS, DCS, NH3- To assess and minimise the cost of ownership of above mentioned disposal processes based on network data collection by ESCAPE-NET.The performance of a monitored network of DAS ESCAPE waste gas abatement systems will be assessed in the production line of the IC manufacturer ZMD.Four critical disposal processes have been selected to demonstrate the technical performance of the networked ESCAPE system under production conditions, together with the cost advantage of monitored networks of abatement systems over the same number of independently used ones. Campo scientifico natural scienceschemical sciencesinorganic chemistrypost-transition metals Programma(i) FP4-ESPRIT 4 - Specific research and technological development programme in the field of information technologies, 1994-1998 Argomento(i) 2.9 - Building blocks, methods & tools for semiconductor app&techs Invito a presentare proposte Data not available Meccanismo di finanziamento EST - Marie Curie actions-Early-stage Training Coordinatore Zentrum Mikroelektronik Dresden Contributo UE Nessun dato Indirizzo Grenzstrasse 28 01109 Dresden Germania Mostra sulla mappa Costo totale Nessun dato