Service Communautaire d'Information sur la Recherche et le Développement - CORDIS

Extreme ultra-violet (EUV) lithography using a laser plasma source and multilayer optics

De 1995-04-01 à 1997-03-31

Détails concernant le projet

Coût total:

Non disponible

Contribution de l'UE:

EUR 50 000

Coordonné à/au(x)/en:

Netherlands

Objectif

Informations connexes

Coordinateur

Stichting voor Fundamenteel Onderzoek der Materie
Netherlands
Edisonbaan 14
3439 MN Nieuwegein
Netherlands
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Contact administratif: BIJKERK
Tél.: +31-30-6096999
Fax: +31-30-6031204

Participants

European Synchrotron Radiation Facility
France
38043 Grenoble
France
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Contact administratif: BRANDEN
KING'S COLLEGE LONDON
United Kingdom
Strand
LONDON
United Kingdom
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Contact administratif: MICHETTE
Russian Academy of Sciences
Russia
117924 Moscow
Russia
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Contact administratif: SOBEL'MAN
Russian Academy of Sciences
Russia
194021 St. Petersburg
Russia
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Contact administratif: GORDEEV
Russian Academy of Sciences
Russia
142432 Chernogolovka, Moscow Region
Russia
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Contact administratif: ERKO
Russian Academy of Sciences
Russia
603600 Nizhny Novgorod
Russia
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Contact administratif: GAPONOV