Objective Distributed feedback (DFB) lasers and surface acoustic wave (SAW) devices are key components in optical fibre and wireless telecommunication systems. The former allow very accurate definition of the fibre optic system wavelength, and thus by combining a number of DFB lasers with slightly different wavelengths into a simple device (wavelength division multiplexing (WDM) a very high data bit rate can be obtained. SAW devices are low-loss, high-selectivity filters, which enable a high density of communication frequencies for, for example, mobile telephone application. The critical elements in both DFB lasers and SAW devices are high-frequency, uni-directional gratings whose structure and method of fabrication strongly determine the performance and cost of the communication system involved. In the case of WDM DFB lasers whose emission wavelength is 1.5 m, which require a grating line width of ~125 nm, a tremendous cost saving can be gained by monolithically fabricating the different wavelength lasers on the same chip.For SAW devices, improved performance from the next-generation devices for the 2.45 GHz frequency band and the realisation of the next-but-one generation devices for the 5.8GHz b and require grating line widths of~150 nm. The conventional lithographic methods currently employed for manufacturing DFB lasers and SAW filters are not suitable for these next-generation devices. In this project, an alternative lithographic technology based on a holographic method, whose high-resolution capability has been demonstrated in the microelectronics industry, will be adapted and applied to these communication applications. The work will include the development of e-beam lithography for manufacturing high-frequency grating masks, the construction of equipment for recording full-field, "off-axis" holograms from these masks, and the application and evaluation of the off-axis holographic technology for manufacturing the next-generation WDM DFB lasers and SAW devices. BE97-5124 Fields of science natural sciencesphysical scienceselectromagnetism and electronicsmicroelectronicsnatural sciencesphysical sciencesopticsfibre opticsnatural sciencesphysical sciencesopticslaser physics Keywords Nanotechnology Programme(s) FP4-BRITE/EURAM 3 - Specific research and technological development programme in the field of industrial and materials technologies, 1994-1998 Topic(s) 0101 - Incorporation of new technologies into production systems Call for proposal Data not available Funding Scheme CSC - Cost-sharing contracts Coordinator Alcatel Alsthom Recherche EU contribution No data Address Route de Nozay 91460 Marcoussis France See on map Total cost No data Participants (4) Sort alphabetically Sort by EU Contribution Expand all Collapse all Friedrich-Schiller-Universität Jena Germany EU contribution No data Address 1,Max-Wien Platz 07743 Jena See on map Total cost No data Holtronic technologies S.A. Switzerland EU contribution No data Address 12B,Champs-Montants 2074 Marin-Epagnier See on map Total cost No data Microfab AG Liechtenstein EU contribution No data Address Gewerbeweg 9486 Schaanwald See on map Total cost No data Siemens AG Germany EU contribution No data Address 6,Otto-Hahn-Ring 81730 München See on map Total cost No data
