Objective This project studies the interface of amorphous or microcrystalline silicon thin film with single crystalline silicon substrates. Different pre-deposition, deposition and post-deposition technologies are used together with many physico-chemical and electrical characterization techniques. The purpose is to optimize the process parameters from the feedback data of the different analyses in order to obtain non-crystalline or epitaxially structured thin layers for microelectronic applications. Fields of science engineering and technologymaterials engineeringcoating and filmsnatural scienceschemical sciencesinorganic chemistrymetalloids Programme(s) FP2-SCIENCE - Programme plan (EEC) to stimulate the international cooperation and interchange needed by European research scientists (SCIENCE), 1988-1992 Topic(s) Data not available Call for proposal Data not available Funding Scheme CSC - Cost-sharing contracts Coordinator INTERUNIVERSITAIR MIKRO-ELEKTRONICA CENTRUM VZW EU contribution No data Address 75,Kapeldreef 75 3001 HEVERLEE Belgium See on map Total cost No data Participants (2) Sort alphabetically Sort by EU Contribution Expand all Collapse all EINDHOVEN UNIVERSITY OF TECHNOLOGY Netherlands EU contribution No data Address Den Dolech 2 5600 MB EINDHOVEN See on map Total cost No data UNIVERSITAET STUTTGART Germany EU contribution No data Address Keplerstrasse 7 70174 STUTTGART See on map Total cost No data