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INTERFACE PHENOMENA OF THIN FILM AMORPHOUS AND MICROCRYSTALL INE SILICON LAYERS WITH SINGLE CRYSTALLINE SILICON SUBSTRATE S

Objetivo



This project studies the interface of amorphous or microcrystalline silicon thin film with single crystalline silicon substrates. Different pre-deposition, deposition and post-deposition technologies are used together with many physico-chemical and electrical characterization techniques. The purpose is to optimize the process parameters from the feedback data of the different analyses in order to obtain non-crystalline or epitaxially structured thin layers for microelectronic applications.

Tema(s)

Data not available

Convocatoria de propuestas

Data not available

Régimen de financiación

CSC - Cost-sharing contracts

Coordinador

INTERUNIVERSITAIR MIKRO-ELEKTRONICA CENTRUM VZW
Aportación de la UE
Sin datos
Dirección
75,Kapeldreef 75
3001 HEVERLEE
Bélgica

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Coste total
Sin datos

Participantes (2)