Obiettivo Assessment of a 300 mm prototype equipment for the manufacture of semiconductor components. The equipment is a compact size, wet process, single tank reactor, dedicated to the pre-clean steps of advanced front-end CMOS processes (<0.15 µm), e.g. composite gate oxide growth and low temperature epitaxy and hetero-epitaxy. The assessment will cover manufacturing relevant parameters such as throughput, CoO and liquid consumption reduction. It will also evaluate the concept of diluted chemistries for both chemicals consumption reduction and minimum unwanted surface state modification prior to the following process step. Thanks to a coupling with another 300 mm single wafer cluster which benefits of in-line optical characterisation tools, the process parameters of the pre-clean steps will be linked to those of two fundamental steps of the front-end CMOS process: oxidation/nitridation/annealing and low temperature Si and SiGe alloys epitaxy and hetero-epitaxy. Campo scientifico natural scienceschemical scienceselectrochemistryelectrolysisnatural sciencesphysical scienceselectromagnetism and electronicssemiconductivity Programma(i) FP5-IST - Programme for research, technological development and demonstration on a "User-friendly information society, 1998-2002" Argomento(i) 1.1.2.-4.8.3 - Processes, equipment and materials Invito a presentare proposte Data not available Meccanismo di finanziamento ACM - Preparatory, accompanying and support measures Coordinatore FRANCE TELECOM Contributo UE Nessun dato Indirizzo 6 PLACE D'ALLERAY 75505 PARIS 15 Francia Mostra sulla mappa Costo totale Nessun dato Partecipanti (5) Classifica in ordine alfabetico Classifica per Contributo UE Espandi tutto Riduci tutto INFINEON TECHNOLOGIES SC300 GMBH & CO.KG Germania Contributo UE Nessun dato Indirizzo KOENIGSBRUECKER STRASSE 180 01099 DRESDEN Mostra sulla mappa Costo totale Nessun dato INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM VZW Belgio Contributo UE Nessun dato Indirizzo Kapeldreef 75 3001 LEUVEN Mostra sulla mappa Costo totale Nessun dato SCP GERMANY GMBH Germania Contributo UE Nessun dato Indirizzo CARL-BENZ-STRASSE 10 72124 PLIEZHAUSEN Mostra sulla mappa Costo totale Nessun dato SILTRONIC AG Germania Contributo UE Nessun dato Indirizzo HANNS-SIEDEL-PLATZ 4 81737 MUENCHEN Mostra sulla mappa Costo totale Nessun dato STMICROELECTRONICS SA Francia Contributo UE Nessun dato Indirizzo 29 BOULEVARD ROMAIN ROLLAND 92120 MONTROUGE Mostra sulla mappa Costo totale Nessun dato
