Spatially resolved subsurface characterization of semiconductor wafers by high resolution x-ray diffraction
Dal 2001-02-28
al 2002-02-27
Dettagli del progetto
Costo totale:
EUR 128 000Contributo UE:
EUR 128 000Coordinato in:
GermanyMeccanismo di finanziamento:
RGI - Research grants (individual fellowships)Obiettivo
Coordinatore
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
Germany