Structural, electronic and dielectric properties of high-k thin films for microelectronics

Informazioni relative al progetto

ID dell’accordo di sovvenzione: HPMF-CT-2000-01082

Data di avvio 1 Aprile 2001

Data di completamento 31 Marzo 2003

Finanziato da

• Programme for research, technological development and demonstration on "Improving the human research potential and the socio-economic knowledge base" (1998-2002)

Costo totale € 130 712,00

Contributo UE € 130 712,00

Coordinato da

UNIVERSITÀ DEGLI STUDI - L'AQUILA
Italy

Campo scientifico

• engineering and technology › materials engineering › coating and films
• natural sciences › physical sciences › electromagnetism and electronics › microelectronics

Programma(i)

• FP5-HUMAN POTENTIAL - Programme for research, technological development and demonstration on "Improving the human research potential and the socio-economic knowledge base" (1998-2002)

Argomento(i)

Data not available

Invito a presentare proposte

Data not available

Meccanismo di finanziamento

RGI - Research grants (individual fellowships)

Coordinatore

UNIVERSITÀ DEGLI STUDI - L'AQUILA

• Contributo UE: Nessun dato
• Indirizzo: Via Vetoio 10, Coppito ; 67010 ASSERGI ; Italia
• Costo totale: Nessun dato