Obiettivo Pushing 193 nm optical lithography to its limits, LICOTRENAS will provide IC makers with exposure tool performance necessary to manufacture ICs with 100nm (dense) and 70 nm (isolated) features. This project is part of a larger program to develop a high aperture 193 nm high throughput lithography tool, including stable materials, metrology, process, reticle know-how and to demonstrate its feasibility at 100 nm. The work in this specific project is divided in 2 workpackages: manufacturing metrology for materials and sub-systems, and integration of sub-systems plus evaluation of their performance at system level. Programma(i) FP5-IST - Programme for research, technological development and demonstration on a "User-friendly information society, 1998-2002" Argomento(i) 1.1.2.-4.8.3 - Processes, equipment and materials Invito a presentare proposte Data not available Meccanismo di finanziamento CSC - Cost-sharing contracts Coordinatore ASM LITHOGRAPHY B.V. Contributo UE Nessun dato Indirizzo DE RUN 1110 5503 LA VELDHOVEN Paesi Bassi Mostra sulla mappa Costo totale Nessun dato Partecipanti (5) Classifica in ordine alfabetico Classifica per Contributo UE Espandi tutto Riduci tutto CARL ZEISS Germania Contributo UE Nessun dato Indirizzo 73446 OBERKOCHEN Mostra sulla mappa Costo totale Nessun dato HERAEUS QUARZGLAS GMBH & CO KG Germania Contributo UE Nessun dato Indirizzo QUARZSTRASSE 63450 HANAU Mostra sulla mappa Costo totale Nessun dato HONEYWELL SPECIALTY CHEMICALS SEELZE GMBH Germania Contributo UE Nessun dato Indirizzo WUNSTORFERSTRASSE 40 30926 SEELZE Mostra sulla mappa Costo totale Nessun dato LAMBDA PHYSIK AG Germania Contributo UE Nessun dato Indirizzo HANS-BOECKLER-STRASSE 12 37073 GOETTINGEN Mostra sulla mappa Costo totale Nessun dato SCHOTT LITHOTEC AG Germania Contributo UE Nessun dato Indirizzo OTTO-SCHOTT-STRASSE 13 07745 JENA Mostra sulla mappa Costo totale Nessun dato