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300 mm Low Energy Plasma Enhanced Chemical Vapor Deposition

300 mm Low Energy Plasma Enhanced Chemical Vapor Deposition

Leaflet | Map data © OpenStreetMap contributors, Credit: EC-GISCO, © EuroGeographics for the administrative boundaries

Coordinator

STMICROELECTRONICS SA

Address

29 Boulevard Romain Rolland
92120 Montrouge

France

Administrative Contact

Marie Claude MAGNIN

Participants (5)

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MOTOROLA INC.

United States

PICOGIGA INTERNATIONAL SAS

France

SILTRONIC AG

Germany

STMICROELECTRONICS CROLLES 2 SAS

France

UNAXIS BALZERS AG

Liechtenstein

Project information

Grant agreement ID: IST-2001-37191

  • Start date

    1 August 2002

  • End date

    31 July 2004

Funded under:

FP5-IST

  • Overall budget:

    € 3 967 254

  • EU contribution

    € 2 699 089

Coordinated by:

STMICROELECTRONICS SA

France