CORDIS
EU research results

CORDIS

English EN
Exploring new limits to Moore's law

Exploring new limits to Moore's law

Objective

This research proposal is about Extreme Ultra Violet Lithography (EUVL), the next generation technology chosen by the electronics industry to manufacture integrated circuits in 2010 and beyond. It represents an opportunity to boost the intensive efforts made by industry to reach new standards in lithography and achieve European leadership in the highly competitive sector of electronics manufacturing technology and know-how. The Integrated Project more Moore will involve various large and small manufacturing companies and research institutes or universities, all highly specialised in the key domains of EUVL and at the vanguard of European lithography research and development. Under the co-ordination of a leading European manufacturer of chip making equipment, the consortium constitutes a unique platform to integrate expertise in key branches of lithography, and to produce breakthrough technological solutions. The project will develop, ahead of the ITRS international roadmap (described in the main report), semiconductor devices shrunk by an order of magnitude down to the 5-nm size. The essential elements of the "More Moore" integrated research project can be summarised as follows:
- More Moore will build upon and complement the work done in EUVL under National and EUREKA programmes, especially MEDEA+;
- The research will push the limits of lithography to enable and exceed the requirements for the 22 nm node;
- As an Integrated Project, it will extend the RandD network in this domain by including all capable institutes, universities and SME's.

Leaflet | Map data © OpenStreetMap contributors, Credit: EC-GISCO, © EuroGeographics for the administrative boundaries

Coordinator

ASML NETHERLANDS B.V.

Address

De Run 6501, 5504 Dr
5500 Ah Veldhoven

Netherlands

Administrative Contact

Robert Arnold HARTMAN (Dr)

Participants (24)

Sort alphabetically

Expand all

ADVANCED MASK TECHNOLOGY CENTER GMBH AND CO. KG

Germany

CARL ZEISS SMT AG

Germany

CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE

France

COMMISSARIAT A L'ENERGIE ATOMIQUE

France

ENTE PER LE NUOVE TECNOLOGIE, L'ENERGIA E L'AMBIENTE

Italy

EPPRA SOCIETE PAR ACTIONS SIMPLIFIEE

France

FOCUS GMBH GERAETE ZUR ELEKTRONENSPEKTROSKOPIE UND OBERFLAECHENANALYTIK

Germany

FRAUNHOFER GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

Germany

IMAGINE OPTIC

France

INSTITUTE OF SPECTROSCOPY OF RUSSIAN ACADEMY OF SCIENCE

Russia

INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM VZW

Belgium

JOHANNES GUTENBERG-UNIVERSITAET MAINZ

Germany

NATIONAL CENTRE FOR SCIENTIFIC RESEARCH "DEMOKRITOS"

Greece

NETHERLANDS ORGANISATION FOR APPLIED SCIENTIFIC RESEARCH - TNO

Netherlands

PHILIPS EXTREME UV GMBH

Germany

PHYSTEX

Netherlands

SAGEM SA

France

SIGMA-C GMBH SOFTWARE

Germany

SINCROTRONE TRIESTE SOCIETA CONSORTILE PER AZIONI

Italy

SOCIETE PAR ACTIONS SIMPLIFIEE XENOCS

France

STICHTING VOOR FUNDAMENTEEL ONDERZOEK DER MATERIE

Netherlands

TECHNISCHE UNIVERSITEIT DELFT

Netherlands

UNIVERSITAET BIELEFELD

Germany

XTREME TECHNOLOGIES GMBH

Germany

Project information

Grant agreement ID: 507754

  • Start date

    19 December 2003

  • End date

    31 December 2006

Funded under:

FP6-IST

  • Overall budget:

    € 43 622 000

  • EU contribution

    € 23 250 000

Coordinated by:

ASML NETHERLANDS B.V.

Netherlands