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Contenuto archiviato il 2022-12-23

Plasma processes for parallel and tilted liquid crystal alignment

Obiettivo

The problems inherent in the rubbing, which is the conventional procedure for liquid crystal (LC) alignment, often hinder the progress of LCD technology. The present project is aimed to develop novel methods of producing parallel and tilted LC alignment that are based on plasma processes. Sputtering deposition and anisotropic etching of the aligning films will be performed by making use of the anode layer thruster (ALT) which is the unique plasma source capable of generating collimated plasma fluxes from practically any gaseous feeds. Our preliminary results show the large potential of these processes for LC alignment. In the present project new alignment processes will be thoroughly studied and optimised for applications in LCD manufacturing. The merits and the drawbacks of the plasma alignment procedures as compared with other alignment methods will be analysed. The mechanisms of LC alignment underlying the proposed plasma alignment processes will be comprehensively investigated by means of experimental and theoretical methods. The collaborative groups have a long-term experience, on both theoretical and experimental levels, in the area of LC alignment and LCD manufacturing. All basic equipment necessary to carry out the scheduled research is available.

Argomento(i)

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Meccanismo di finanziamento

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Coordinatore

PHILIPS RESEARCH
Contributo UE
Nessun dato
Indirizzo
PROF. HOLSTLAAN, 4
EINDHOVEN
Paesi Bassi

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Costo totale
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Partecipanti (3)